Structural and Optical Features of Si-Rich-SiO2 Films Prepared by Magnetron Sputter Techniques

초록

Si-Rich-SiO2 films were prepared by R.F. magnetron sputter techniques; particular numbers of 5x5x0.5 mm3-sized Si chips were co-sputtered with a pure silica target of 2 inches in diameter. The structural, optical and chemical features of the Si nanocrystals in SiO2 were investigated in terms of various process parameters such as the numbers of Si chips and post-deposition annealing conditions.