플라즈마 중합과 플라즈마 에칭을 이용한 나노미터 단위의 진공리소그래피

초록

This work was carried out to develop a pattern on the nanometer scale using plasma polymerization and plasma etching. This study is also aimed at developing a resis for the nano process and a vacuum lithography process. The thin film of plasma polymerization were favricated by the plasma polymerization of inter-electrode capacitively coupled gasflow system. After delineating the pattern at accelerating voltage of 30[kV], ranging the dose of 1∼500[mC/Cm2], the pattern was developed with type and formed by plasma etching. By analysing of the molecule structure using FT-IR, it was confirmed that the thin films of PPMST contains the functional radicals of the MST monomer. The thin films of PPMST had a highly crosslinked structure resulting in a higher molecule weight than the conventional resist