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- 제목
- Kinetic Monte Carlo Study on Boron Diffusion with Carbon Pre-implant posterior to Amorphization Process
- 저자
- WON TAEYOUNG
- 학회명
- 30th International Conference on the Physics of Semiconductors
- 개최지
- Hall B2, COEX, Seoul, Korea
- 학회 개최일
- 2010-07-25 ~ 2010-07-30