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Control of duty ratio in waveguide gratings using a Near-Field Holographic lithography system with a variable aperture
LEE EL HANG
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Control of duty ratio in waveguide gratings using a Near-Field Holographic lithography system with a variable aperture
저자
LEE EL HANG
학회명
MNE, 33rd International Conference on Micro-and Nano-Engineering 2007
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