Antireflection subwavelength structure of silicon surface formed by wet process using catalysis of self-aggregated gold nano particle

초록

A Subwavelength structure (SWS) was formed by simple wet chemical etching using catalysis of gold (Au) nanoparticle. Single nano-sized Au particle was fabricated by self-aggregation effect. Au was deposited 2, 4 and 6 nm by sputter, and annealed about 500°C on hotplate. Then, the samples were soaked in an aqueous etching solution of hydrofluoric acid and hydrogen peroxide. The surface of 15-min-etched Si substrate appeared black. The reflectivity of the Si substrate was reduced to below 5% throughout the entire spectrum from 300 to 800 nm owing to SWS. The fractional area occupied by Si as a function of the depth across the textured layer showed a smooth increase of density up to a depth. The observed optical effects were explained by the formation of a subwavelength scale taper structure, representing an effective medium with a smooth transition of the refractive index from air to Si.