대면적 플라즈마 소스에의 E-ICP 적용과 그 효과 비교

초록

Large area plasma source becomes important as the substrate size increases. In this work, four inductively coupled plasma(ICP) unit sources are distributed 2×2 array. E-ICP concept is applied to the 2×2 array ICP and its effect is examined. Characteristics of the plasma are measured, and photoresist etching is performed with oxygen plasma. Good etching characteristic in terms of etching rate and uniformity can be obtained with E-ICP.