Large Area Plasma by Individually Controllable Array Sources

초록

Large area plasma source has been built for LCD etcher by an array of 2x2 ICP antennas, while one RF power supply with only one matching network is used. Each spiral shape antenna has a movable tap and its inductance can be adjusted. RF power delivered to each source can be adjusted individually to obtain uniform plasma. Uniformity can be improved further by adding time-varying axial magnetic field. Plasma characteristics are measured and anisotropic etching of photoresist is performed.