ScholarWorks@인하대학교

상세 보기

Nanostructural and Chemical Bonding Features of nc-Si:H Thin Films Prepared by PECVD Techniques with Various Alternating Current Biases Conditions

  • CHO NAMHEE
제목
Nanostructural and Chemical Bonding Features of nc-Si:H Thin Films Prepared by PECVD Techniques with Various Alternating Current Biases Conditions
저자
CHO NAMHEE
학회명
2009년 한국세라믹학회 추계총회 및 연구발표회
학회 개최일
2009-10-19 ~ 2009-10-20

ScholarWorks@인하대학교

22212 인천광역시 미추홀구 인하로 100 정석학술정보관 Tel. 032-860-9003

COPYRIGHT © 인하대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.