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초록
Nitrogen trifluoride (NF3) gas is being widely used for a chamber cleaning process in the semiconductor and display industry.
- 제목
- Decomposition of nitrogen trifluoride using a low power arc plasma
- 저자
- DONG WHA PARK
- 학회명
- APCPST & SPSM 2010
- 개최지
- 제주 롯데호텔
- 학회 개최일
- 2010-07-04 ~ 2010-07-08