Antireflective silicon subwavelength structure formed by self-aggregated gold nano particle as a catalysis

초록

Polished flat silicon (Si) surfaces have a high natural reflectivity with a strong spectral dependence. The minimization of reflection losses is very important for high efficiency solar cells, and hence, a variety of approaches has been developed to this end. Texturization treatment of Si based on a noble metal assisted chemical etching has been reported recently. It is performed in a solution containing hydrofluoric acid (HF) and hydrogen peroxide (H2O2) which does not etch Si except in presence of noble metal catalysts. Noble metals are deposited on Si surface prior to HF/H2O2 etching. The localized Si dissolution results in the formation of textured surface on the Si.