ScholarWorks@인하대학교

상세 보기

Atomistic Modeling for Understanding the Suppression of Boron Diffusion in Ge Pre-amorphized Silicon Substrate

  • WON TAEYOUNG
제목
Atomistic Modeling for Understanding the Suppression of Boron Diffusion in Ge Pre-amorphized Silicon Substrate
저자
WON TAEYOUNG
학회명
Micro-and Nano-Engineering 2006 32nd International Conference

ScholarWorks@인하대학교

22212 인천광역시 미추홀구 인하로 100 정석학술정보관 Tel. 032-860-9003

COPYRIGHT © 인하대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.