Imaging Behavior of Highly Fluorinated Molecular Resists under Extreme UV Radiation

초록

We propose a concept of organic small molecule-based EUV resists that do not require sub-stoichiometric ingredients. Based on our previous results with highly fluorinated electron-beam (e-beam) resists, we designed amorphous small molecules equipped with perfluoroalkyl ether (PFAE) chains The synthesis of the prototype was carried out successfully, and its physical properties, imaging mechanism, and performance were all evaluated under e-beam exposure conditions. Although the prototype showed slightly low sensitivity to EUV irradiation, we were able to mitigate the issue by appending other cross-linkable functional moieties. The modified version showed decent negative-tone patterning performance under e-beam exposure and could form images under EUV irradiation and the pattern development step using highly fluorinated solvents.

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