ScholarWorks@인하대학교

상세 보기

Hard-mask Etch Process Using ArF Photoresist and Conventional ICP System

  • LEE EL HANG
제목
Hard-mask Etch Process Using ArF Photoresist and Conventional ICP System
저자
LEE EL HANG
학회명
AVS 2005 Program Book Topic MS

ScholarWorks@인하대학교

22212 인천광역시 미추홀구 인하로 100 정석학술정보관 Tel. 032-860-9003

COPYRIGHT © 인하대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.