Dielectric Properties and Structural Analysis of PZT Film Fabricated by Aerosol Deposition Method

초록

PZT [Pb(Zr0.52Ti0.48)O3] thick films of with a thickness of 5-10㎛ at morphotropic phase boundary, were fabricated by aerosol-deposition (AD) process. The AD method can fabricate films through the collision of fine ceramic powder particles onto substrate. By using the AD method, the PZT films revealed nano-size grain and dense structure at the room temperature. We control the post annealing temperatures to control the phase transition behavior. The crystallinity AD PZT thick films was enhanced by annealing at 450, 550 and 650℃ for 2h. The dielectric and ferroelectric properties for the various temperatures were also examined by the analysis of dielectric characteristics.