UV-Visible Antireflection Coating with Hollow Mesoporous Silica Nanoparticles on Various Polymer Substrates

초록

To achieve good antireflective(AR) behavior with various types of films, we deposited hollow mesoporous silica nanoparticles (HMSNs) onto highly transparent polymer substrates such as poly(ethylene terephthalate) (PET), poly(methyl methacrylate) (PMMA), and polystyrene (PS). HMSNs were initially synthesized using monodisperse polymer colloids, together with tetraethylorthosilicate (TEOS) as precursor and cetyl trimethylammonium bromide(CTAB) as a structure-directing agent. The deposition of HMSNs onto the substrates was carried out by spin coating or brush-painting. Subsequently, HMSNs were treated under simple conditions by being exposed to a solvent vapor at room temperature. The size, shell thickness and void volume fraction of HMSNs affected refractive index, transmittance and reflection of the final films. The size, thickness of substrate and depth of HMSNs were investigated by cross sectional SEM and TEM showed. AFM was also used to observe surface topography on flat substrates.