ScholarWorks@인하대학교

상세 보기

Residual Layer Distribution on Embossing Process for Photonic Devices

Residual Layer Distribution on Embossing Process for Photonic Devices
제목
Residual Layer Distribution on Embossing Process for Photonic Devices
제목 (타언어)
Residual Layer Distribution on Embossing Process for Photonic Devices
저자
O BEOM HOAN
학회명
CLEO/PR 2007

ScholarWorks@인하대학교

22212 인천광역시 미추홀구 인하로 100 정석학술정보관 Tel. 032-860-9003

COPYRIGHT © 인하대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.