Photolithography Patterning of Organic Light-Emitting Diodes Using Solvent Resistant Electron Transport Materials

초록

In this paper, we develop a novel approach to achieve ultra-high resolution in organic light-emitting diodes (OLEDs) through a photolithography patterning process. It is important to apply a solvent resistant electron transport layer (ETL) in the photolithography pattering of OLED because of solution coating process of photoresist on the ETL. Therefore, a solvent resistant ETL named 2,7-bis(4,6-diphenyl-1,3,5-triazin-2-yl)-9,9′-spirobi[fluorene] (SBF-Trz) was developed and employed as the ETL of OLEDs. The SBF-Trz demonstrated excellent solvent resistance during photolithography process and enabled device performances comparable to those of the conventional OLED without any photolithography process. It was found that the SBF-Trz ETL is appropriate as the ETL of the OLED patterned by photolithography due to good electron transport property, good stability, and good solvent resistance. © 2024, John Wiley and Sons Inc. All rights reserved.

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