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초록
Perfluorocompounds (PFCs) including CF4, C2F6, C3F8, CHF3, SF and NF3 are widely using as etching and cleaning gases in the semiconductor and display industries.
- 제목
- Numarical simulation on an influence of water spray in a thermal plasma treatment of CF4 gas
- 저자
- DONG WHA PARK
- 학회명
- APCPST & SPSM 2010
- 개최지
- 제주 롯데호텔
- 학회 개최일
- 2010-07-04 ~ 2010-07-08