Experimental Study of Surfactant-Assisted Sludge Prevention in Advanced Packaging Processes

초록

This study systematically investigates sludge formation mechanisms in wastewater generated during the advanced packaging process and explores effective suppression methods using surfactants. Primary chemical agents including HMDS, photoresist (PR), and PR developer are identified as sludge-forming agents. Solid sludge is observed due to the hydrolysis and condensation of HMDS, which forms sludge seeds that further grow via hydrophobic interactions with PR. To prevent sludge formation, surfactants such as CTAB, PEG, and commercial surfactants are introduced. Notably, the sludge generation is not formed due to hindered hydrophobic bonding between PR and HMDS-derived particles. This result suggests that surfactant addition can serve as a practical approach to mitigate drain and pipe blockage in advanced packaging processes. -본 연구는 2025년도 정부(교육부)의 재원으로 한국연구재단의 지원을 받아 수행된 기초연구사업임(RS-2022-NR070869). Keywords: Advanced packaging, Graphene oxide, Lithium titanate oxide, Freeze-drying, Plasma treatment.