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초록
RF magnetron sputter techniques were used to prepare the rare earth ions doped nc-Si thin films. We investigaed the nano-structural and chemical characteristics of the rare earth ions doped nc-Si films as a function of deposition parameters and post-deposition heat-treatment conditons.
- 제목
- Effect of Rare Earth Ions Doping on the Nano-structural and Optical Features of Nano-crystalline Si Thin Films
- 저자
- CHO NAMHEE
- 학회명
- 9th International Conference on the Formation of Semiconductor Interfaces