A New Lithography of Functional Plasma Polymerized Thin Films

초록

plasma polymerized thin films were manufactured as a resist to be applied to the vacuum lithography process and nano scale patterns were manufactured by plasma etching after exposing the wafer to an electron beam. The plasma thin film was manufactured using MMA as a monomer and the power was 20 120W, system pressure 0.05 0.7 torr and the gas flow 10/min. The polymerization rate of the thin film manufactured by the plasma polymerization apparatus was about 245-776/min(system pressure 0.2torr, gas flow rate 10ml/min) as a function of the increase in power and about 500-76/min (power 50W, gas flow rate 10ml/min)