Self-assembly of block copolymer thin films under controlled swelling system

초록

As demand for smaller and more effiecient devices grows, conventional lithography based patterning process has faced to resolution limit. Self-assembly of block copolymer(BCP) is a promising method in nanostructure patterning industry. BCP constructs deverse structures according to phase separation condition; X (Flory-Huggins interaction parameter), N (degree of polymerization) and fA (volume fraction). We introduce solvent vapor annealing (SVA) system which provides systematically controlled solvent/N2 mixture atmosphere in a reproducible manner. Through our system, BCP thin film rapidly constructs uniform nano-structures in a large area and swelling gradients in a specific area of film by changing time-dependently programmed flow ratio. We expect to induce BCP alignment propagating from ordered structure to disordered structure. In-situ film thickness is measured by Filmetrics and the morphology of film is presented in SEM images after reactive ion etching (RIE) treatment.