Advantages of using UV Transparent Polymer Mold in UV Nanoimprint Lithography of Nanophotonic Devices

초록

We propose and demonstrate, for the first time to our knowledge, the use of ultra violet (UV)-transparent polymer molds for UV-nanoimprint lithography (UV-NIL) of nano-photonic devices and circuits. In UVNIL the transparent polymer mold is considered useful for UV-opaque substrates like silicon. By coating an anti-adhesion layer on the UV-transparent polymer mold we were able to achieve high contact angles (or hydrophobic surface) and obtain well-defined nanowire devices such as micro-ring resonators by UV-NIL.