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초록
In this paper, resist trimming method was applied to reshape a SU8 based waveguide structure to eliminate Ttopping effect. Resist trimming process was carried with a ICP system, and well-trimmed curved-shape SU8 waveguide was obtained. Developed process provides predictable etch shapes with controlled process conditions, thus can be used to make curved-shape waveguide structures.
- 제목
- 식각율 차이를 이용한 곡면 가공
- 제목 (타언어)
- The development of curved structure manufacturing using selective plasma etching
- 저자
- LEE EL HANG
- 학회명
- 한국광학회 (대명콘도 대명), Photonics Conference 2004