ScholarWorks@인하대학교

상세 보기

Etching Characteristic of Zr-silicate in Cl2-based plasma

Etching Characteristic of Zr-silicate in Cl2-based plasma
  • LEE SEUNG GOL
제목
Etching Characteristic of Zr-silicate in Cl2-based plasma
제목 (타언어)
Etching Characteristic of Zr-silicate in Cl2-based plasma
저자
LEE SEUNG GOL
학회명
Symposium of 6th APCPST (Asia Pacific Conference on Plasma Science)

ScholarWorks@인하대학교

22212 인천광역시 미추홀구 인하로 100 정석학술정보관 Tel. 032-860-9003

COPYRIGHT © 인하대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.