집속 레이저 빔에 의한 PDP 격벽의 마스크레스 식각

Maskless etching of the PDP barrier rib using focused laser beam

초록

The PDP(Plasma Display Panel) barrier rib was fabricated by focused Ar+ laser(λ=514 ㎚) and Nd:YAG(λ=532, 266 ㎚) laser irradiation. The depth of the etched groove increases with increasing a laser fluence, and decreasing a scan speed. Using the second harmonic of the Nd:YAG laser, the threshold laser fluence was 6.5 mJ/㎠ for the sample of PDP barrier rib dried at 120 ℃. The thickness of 150 ㎛ of the sample on the glass was etched without any damage on the glass substrate by fluence of 19.5 J/㎠. The barrier rib sample on hot plate was etched by Nd:YAG laser(532 ㎚) as increasing a temperature of the sample. In this case, the etch rate was 95 ㎛/s, 190 ㎛/s at room temperature, 175 ℃ respectively. Laser direct etching for a PDP cell using Nd:YAG laser

제목
집속 레이저 빔에 의한 PDP 격벽의 마스크레스 식각
제목 (타언어)
Maskless etching of the PDP barrier rib using focused laser beam
저자
CHEON LEE
학회명
대한전기학회 하계학술대회 논문집(1999)