홀로우캐소드플라즈마의 듀얼챔버에 대한 중성입자 유동해석

초록

It is very important to know the gas flow dynamics in a reaction chamber of dry etching or chemical vapor deposition. In this work, dual chamber for phtoresist stripping process is modeled and in neutral gas flow paterns are analyzed using CF dsign simulator..................overall flow patterns from the gas inlet to chamber exhaust are studied.