Fabrication of ultra clean single layer graphene oxide with controlled oxygen adatom coverage

초록

Graphene has attracted significant interest due to its extraordinary physical and chemical properties and these properties further need to be tailored for specific applications. Chemical functionalization is a simple and most promising method for tailoring the graphene properties[1]. Various chemical and physical methods have been explored for functionalizing the graphene surface with various adatoms like oxygen, nitrogen, fluorine were reported. Among them, graphene oxide has remarkable properties and provides good capability of tuning the chemical and physical properties. The amount of oxygen adatom concentration was demonstrated to be important parameter in modulating the properties of graphene. Like, the wettability, electrical and optical properties [2]. Further, the properties of oxygen adatom being stable at bride site (above the center of two carbon atom) and potential to migrate from one bridge site to another via external energy[3] gives stability and flexibility in controlling the properties. However, chemical impurities such as –COOH, -OH, were unavoidable in chemical method and they also has great impact on properties. In present study, we report clean fabrication of single layer graphene oxide film by thermal oxidation methods. The concentration of oxygen adatom was controlled by oxidation time and we also, present its implication on surface properties of single layer graphene.