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A study on a perturbation layer to reduce the total thickness of TaN absorber stack of binary mask in extreme ultraviolet lithography

  • CHANG KWON HWANGBO
제목
A study on a perturbation layer to reduce the total thickness of TaN absorber stack of binary mask in extreme ultraviolet lithography
저자
CHANG KWON HWANGBO
학회명
2011년 한국물리학회 가을학술논문발표회 및 임시총회
개최지
부산, BEXCO
학회 개최일
2011-10-19 ~ 2011-10-21

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