Large Area Plasma by Individually Controllable Array Sources

초록

IMID 2001 (International Meeting on Information Display) at daegu EXCO, August 29 ∼ 31 (2001). IMID 2001 Digest, Large area plasma source has been built for LCD etcher by an array of 2x2 ICP antennas, while one RF power supply with only one matching network is used. Each spiral shape antenna has a movable tap and its inductance can be adjusted. RF power delivered to each source can be adjusted individually to obtain uniform plasma. Uniformity can be improved further by adding time-varying axial magnetic field. Plasma characteristics are measured and anisotropic etching of photoresist is performed.