Effect of ion-beam assistance on TiO2 films deposited by reactive magnetron sputtering

초록

We have attempted to take advantage of he benefits from both reactive DC magnetron sputtering and ion-beam assisted deposition in order to deposit the optical thin films with high packing density and high refractive index, and smooth surface. A reactive magnetron sputtering system was modified such that an end-Hall ion source assisted the growing thin film from reactive DC magnetron sputtering. The throw distance from target to substrate was increased to 350mm. In this study, the effect of the Ar ion-beam current on optical and structural properties of the reactive DC magnetron sputtered films was reported. And the as-deposited films were subjected to annealing at temperature range of 200 ~ with atmosphere environment, and the properties of films after annealing were investigated.