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Dependence of Etch Selectivity of SiO2 Etching onthe Axial Magnetic Field in ICP

Dependence of Etch Selectivity of SiO2 Etching onthe Axial Magnetic Field in ICP
  • PARK SEGEUN
제목
Dependence of Etch Selectivity of SiO2 Etching onthe Axial Magnetic Field in ICP
제목 (타언어)
Dependence of Etch Selectivity of SiO2 Etching onthe Axial Magnetic Field in ICP
저자
PARK SEGEUN
학회명
AVS, ICMCTF 2003 Program

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