Patterning of Pt/RuO2 electrodes for Pb(Zr,Ti)O3 in an Inductively Coupled Cl2/O2 plasma

초록

Inductively coupled plasma excited by a helical antenna is used to pattern Pt/RuO2 electrodes for PZT. The hybrid electrode of thin Pt on thicker RuO2 layer has been studied because of good leakage current characteristics of Pt and easy etch characteristics of RuO2. The etch rates and selectivities to oxide hard mask have been measured for each of Pt and RuO2 in terms of O2/Cl2 mixture ratio. The ratio of 10% Cl and 90% O2 has been chosed for the optimum condition, and patterning of sub-half micron electrodes is demonstrated.