상세 보기
Aggressively Scaled High-k Gate Dielectric with Excellent Performance and High Temperature Stability for 32nm and Beyond
- 제목
- Aggressively Scaled High-k Gate Dielectric with Excellent Performance and High Temperature Stability for 32nm and Beyond
- 저자
- RINO CHOI
- 학회명
- 2007 IEEE International Electron Devices Meeting