Sm-Fe 박막 MEMS 작동기의 자기변형 실험

초록

In this paper, Sm-Fe thin films of 1000A thickness are fabricated by DC magnetron sputtering. Sm-Fe thin films are prepared by DC magnetron sputtering method in the composition of SmxFel-x (x=0.4). The thin films are deposited to a thickness of 1000A on Si substrate with a thickness of 50m. The fabricated microstructures are observed by X-ray diffraction (XRD) and the film thickness is measured by using a Ellipsometer. The compositions of sputtered thin films are examined by energy dispersive spectroscopy (EDS). Magnetostrictions are determined from the curvature of the thin films which are measured by the optical cantilever method. The experimental results are discussed with numerical data.