RF PACVD법에 의한 WC-Co에 성장된 다이아몬드 박막의 특성

The Characteristic of Diamond Thin Films on WC-Co by RF PACVD
  • Lee Duck Chool

초록

We prepared diamond thin films on WC-Co substrate in H2-CH4-O2 gas mixture using 13.56MHz RF PACVD. Scanning electron microscopy, X-ray diffraction and Raman spectroscopy were used to analyze the nature of thin film, and Rockwell test to analyze the adhesion between thin film and substrate. The good diamond quality and adhesion was appeared with cemented tungsten carbide substrate treated with oxygen plasma.

제목
RF PACVD법에 의한 WC-Co에 성장된 다이아몬드 박막의 특성
제목 (타언어)
The Characteristic of Diamond Thin Films on WC-Co by RF PACVD
저자
Lee Duck Chool
학회명
대한전기학회 하계학술대회