Optimal design of antireflective layer for DUV lithography and their experimental results

초록

A new methodology using the admittance diagram is proposed for optimization of an antireflective layer (ARL) and the simple ARL optimizer with its own 2D and 3D dynamic graphic tools is developed. Under the methodology, the overall dependency of the reflectivity on optical properties of ARLs can be viewed from a single 2D graph, and the tolerance of process step for the optimally designed ARL can be evaluated graphically.