Preparation of Low-κ Sol-Gel Hybrid Films Containing Hollow Mesoporous Silica Nanospheres

초록

A series of novel low-κ hybrid films containing hollow mesoporous nanospheres were synthesized using nonhydrolytic sol-gel processing. Organic-inorganic hybrid materials as a matrix were covalently-bonded with the organically modified hollow mesoporous silica (HMS) nanoparticles by chemical crosslinking. To enhance the dispersion stability of the HMS nanospheres in the hybrid matrix, the chemical nature of their surfaces were modified using diethyl 3-(trimethoxysilyl)propyl phosphonate (TMSP), which was synthesized by the Michaelis-Arbuzov reaction of chloropyltrimethoxysilane (CPTMS) with 3-triethyl phosphate (TEP). The dielectric performance of these organic-inorganic nanohybrids was measured to show low permittivity and large dielectric strength.