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Molecular resists equipped with fluorinated aromatic units for electron-beam and extreme UV lithography
- 제목
- Molecular resists equipped with fluorinated aromatic units for electron-beam and extreme UV lithography
- 저자
- LEE JINKYUN
- 학회명
- SPIE Advanced Lithography
- 개최지
- San Jose
- 학회 개최일
- 2020-02-23 ~ 2020-02-27