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초록
Plasma polymerized thin films were fabricated by interelectrode capacitively coupled type apparatus. FT-IR analyses indicated that the thin film spectra are composed not only of the corresponding monomer bands but also of several new bands. Relative dielectric constant and fabricated in the discharge power of 90[W] showed 3.21 2∼3.085 and 0.0026∼0.0451 in alternating frequency of 103∼106[Hz]. Contact angle measurement indicated that cross-link of the films is increased with the discharge power.
- 제목
- 프라즈마중합 헥사메틸디실록산 박막의 제조 및 특성에 관한 연구
- 제목 (타언어)
- A study on the fabication and characteristics of plasma polymerized hexamethyldisiloxane thin films
- 저자
- Lee Duck Chool
- 학회명
- 대한전기학회