멤스 미소 거울의 희생층 재료와 제거 공정의 최적화

Improved Etch Process for Sacrificial layer of MEMS Micro-Mirror
  • PARK SEGEUN

초록

It is important for a micro-mirror surface to have high optical characteristics. As a conventional micro-mirror surface of a poly-Si structural layer has poor reflectivity, it needs a metal coating layer to improve it. But, during sacrificial etch process, applied metal layers can easily be broken. Various structural layer materials and wet-etch chemistries were applied to fabricate a MEMS micromirror process. As a result, we have fabricated a MEMS micro-mirror without quality loss.

제목
멤스 미소 거울의 희생층 재료와 제거 공정의 최적화
제목 (타언어)
Improved Etch Process for Sacrificial layer of MEMS Micro-Mirror
저자
PARK SEGEUN
학회명
한국광학회, Photonics Conference 2003 Proceeding