자화 플라즈마의 주기적 특성 변화와 E-ICP

초록

It is important to control the plasma characteristics for high quality plasma process. Recently, a novel method proposed by us, named as 'Enhanced-ICP', using periodic weak time-varying axial magnetic field added to a normal ICP source, has improved etch characteristics much. Variation of plasma characteristics according to the frequency of time-varying axial magnetic field have been measured and analyzed.