Design of Block Copolymers for Directed Self-Assembly and Nanopatterning

초록

Nanotechnology has embraced a directed self-assembly of block copolymers as one of next-generation lithographic tools to achieve sub-10 nm technical node. To attain the ultimate goal, tailoring properties and structures in block copolymer materials is one of significant and challenging aspects. In this talk, we will discuss the design of block copolymers which can extensively push the limit of a critical dimension to sub-10 nm regime. To do so, the structure of the copolymer should be designed to exhibit high interaction parameter for phase separation at lower degree of polymerization. Next, finding effective synthetic routes will be discussed to emphasize how the design of block copolymers can be realized. Finally, we will discuss how we evaluate synthesized block copolymers in terms of reducing the size of periodic patterns, which is directly correlated to lithographic applications.