Photosensitive Crosslinkable Polymeric Systems to Form Functional Surfaces Utilizable for Lithographic Applications

초록

In past decades, photopatterning materials have been exploited in a range of applications including integrated circuit, displays, storage materials, and so on. They have been successful to make the structures on various dimensions in micro- and nano-scales. Beyond the conventional use for the patterning, functional materials that need to be patterned are all around in general scientific and engineering fields. The key of these pattern fabrications is preserving vital functionalities for target applications. In this talk, we demonstrate a new simple, mild and clean, chemically adjustable, and photocrosslinkable copolymer system based on o-nitrobenzyl functionalities enabling us to engineer the chemical properties of surfaces. The essential chemical principles are extended to fabricate the surfaces with quantitatively controlled chemical reactivity and more importantly, spatially controlled self-assembly of block copolymer in thin film enabling simple and versatile nanopattern fabrication.