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Etch characteristics comparison of nanometer scale TiN hard masked MTJ stacks etched in a constant wave and pulse modulated plasma
- 제목
- Etch characteristics comparison of nanometer scale TiN hard masked MTJ stacks etched in a constant wave and pulse modulated plasma
- 저자
- CHUNG CHEE WON
- 학회명
- 38th International Symposium on Dry Process
- 개최지
- Sapporo, Hokkaido
- 학회 개최일
- 2016-11-21 ~ 2016-11-22