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전체 253건 중 1번부터 10번까지의 결과를 표시합니다.
2026
Article
Atomic layer deposition of Ga2O3 over a wide temperature range using a novel heteroleptic precursor (N,N-di-tert-butylacetimidamido)dimethylgallium (DBADMGa)
- Hwang, Inhong ;
- Lee, Jun Yong ;
- Jeon, Dahui ;
- Choi, Rino ;
- Lee, Jeong-Hwan ;
- ... Park, Noh-Hwal ;
- ... Chung, Chee Won ;
- ... Baek, In-Hwan ;
- 외 3명
- 2026-10
- Applied Surface Science
- ELSEVIER
Article
Anisotropic Etching of Cobalt Thin Films Using High Density Plasma of Ethylenediamine/Ar Gas Mixture
- Yang, Hong Ju ;
- Oh, Kyung Ho ;
- Chung, Chee Won
- 2026-04
- Korean Journal of Chemical Engineering
- KOREAN INSTITUTE CHEMICAL ENGINEERS
2025
Article
Redeposition-free dry etching of copper thin films using organic gas mixtures
- Cho, Yoon Jae ;
- Song, Ha Rin ;
- Yang, Hong Ju ;
- Won, Dae Han ;
- Chung, Chee Won
- 2025-12
- Vacuum
- PERGAMON-ELSEVIER SCIENCE LTD
Article
Influence of an etch mask on the etch profile of copper thin films in propanol/Ar gas mixture
- Cho, Yoon Jae ;
- Ha, Su Myung ;
- Chung, Chee Won
- 2025-01
- Materials Science in Semiconductor Processing
- Pergamon Press
2024
Article
Deep etching of copper thin film using high-density plasma of hydrocarbon/alcohol gases
- 정지원 ;
- 하수명 ;
- 조윤재 ;
- 윤수영 ;
- Jong Uk Bae ;
- 외 2명
- 2024-12
- 반도체디스플레이기술학회지
- 한국반도체디스플레이기술학회
Article
Etch characteristics of cobalt thin films using high density plasma of CH3COCH3/Ar gas mixture
- Baek, Geum Bin ;
- Oh, Kyung Ho ;
- Chung, Chee Won
- 2024-11-15
- Microelectronic Engineering
- Elsevier BV
Article
Etch characteristics of cobalt thin films using high density plasma of halogen gas
- Oh, Kyung Ho ;
- Baek, Geum Bin ;
- Chung, Chee Won
- 2024-05
- Thin Solid Films
- Elsevier Sequoia
Article
Fine-line formation of cobalt thin films via cyclic etching using two-step process
- Kim, Seon Jae ;
- Jeong, Jun Won ;
- Oh, Kyung Ho ;
- Bin Baek, Geum ;
- Chung, Chee Won
- 2024-03-01
- Materials Science in Semiconductor Processing
- Pergamon Press
2023
Article
Two-Step Cyclic Etching of Copper Thin Films Using Acetylacetone/O2 Gases
- Kim, Seung Hyun ;
- Lim, Eun Taek ;
- Park, Sung Yong ;
- Chung, Chee Won
- 2023-07-01
- ECS Journal of Solid State Science and Technology
- Electrochemical Society, Inc.
Article
High-density plasma etching of cobalt thin films using C2H5OH/O2/Ar gas mixture
- Kim, Seon Jae ;
- Jeong, Jun Won ;
- Park, Sung Yong ;
- Chung, Chee Won
- 2023-07
- Materials Science & Engineering B: Solid-State Materials for Advanced Technology
- Elsevier BV
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