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High Density Plasma Reactive Ion Etching of Cobalt Thin Films Using Ethylenediamine/Ar Gas Mixture
- 제목
- High Density Plasma Reactive Ion Etching of Cobalt Thin Films Using Ethylenediamine/Ar Gas Mixture
- 저자
- CHUNG CHEE WON
- 학회명
- The 32nd Korean conference on semiconductors
- 개최지
- 강원도 하이원 리조트
- 학회 개최일
- 2025-02-12 ~ 2025-02-14