Ferroelectric Emission Studies for Electron Emission Lithography Application

전자발광 리소그래피응용을 위한 강유전체 발광연구

초록

Ferroelectric switching emission, dielectric switching emission, and pyroelectric emission were studied by patterning images on electron resists for electron emission lithography applications. It was observed that the pyroelectric emission is most acceptable for a high throughput 1:1 electron projection lithography application. 1:1 electron projection lithography was demonstrated by patterning images with line width of 30mm and 50mm by utilizing pyroelectric emission. Degradation in pyroelectric emission was observed in the course of repeated heating cycle under phase transition temperature (TC). The degradation was eliminated and prevented by heating the pyroelecric emitter to reach the temperature higher than TC.

제목
Ferroelectric Emission Studies for Electron Emission Lithography Application
제목 (타언어)
전자발광 리소그래피응용을 위한 강유전체 발광연구
저자
CHUNG CHEE WON
학회명
Proceedings of the 14th IEEE In of the 14th IEEE International Symposium on Applications of Ferroelectrics