Etch Characteristic of Gallium Indium Zinc Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching in Chlorined Based Gases

제목
Etch Characteristic of Gallium Indium Zinc Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching in Chlorined Based Gases
저자
CHUNG CHEE WON
학회명
The 29th International Symposium on Dry Process