상세 보기
Etch Characteristics of Ta Thin Films Using Halogen Containing Gas Mixtures in Inductively Coupled Plasma for Hard Mask Applications
- 제목
- Etch Characteristics of Ta Thin Films Using Halogen Containing Gas Mixtures in Inductively Coupled Plasma for Hard Mask Applications
- 저자
- CHUNG CHEE WON
- 학회명
- International Conference on Chemical, Metallurgy and Material Science Engineering (CMMSE-2015)
- 개최지
- Pattaya
- 학회 개최일
- 2015-08-10 ~ 2015-08-11